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enables to form stable ultra-thin film, which is important for transparent ito/ag/ito structure. this technology is expected to be applied to various emerging devices such as flexible displays. table 1. sputtering conditions of ito and ag iv. results and discussions discussionsat the all thickness, pure
durability. ref.) [1] k. sawada et al, jpn. j. appl. phys., 40, 3332-3336, (2001) [2] c. guillen and j. herrero, optics communications, 282, 574-578, (2009) [3] s. cho et al, thin solid films, 516, 7881-7885, (2008) [4] y. park et al, journal of the electrochemical society, 156(7), h588-h594, (2009) ito pure...
http://www.mmc.co.jp/adv/ele/en/news/target/2018-ta02.pdf