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aligns photo mask pattern on photoresist layer, exposes pattern to ultraviolet light, and develops pattern, using specialized equipment. ) alters electrical nature of wafer layers according to photo mask patterns to form integrated circuits on wafers, using equipment, such as acid baths, diffusion furnaces
aligns photo mask pattern on photoresist layer, exposes pattern to ultraviolet light, and develops pattern, using specialized equipment. ) alters electrical nature of wafer layers according to photo mask patterns to form integrated circuits on wafers, using equipment, such as acid baths, diffusion furnaces...
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